Evaluation of Pre-Amorphized Layer Thickness and Interface Quality of High-Dose Shallow Implanted Silicon by Spectroscopic Ellipsometry

✍ Scribed by Shibata, S.; Kawase, F.; Kitada, A.; Kouzaki, T.; Kitamura, A.

• Book ID: 119820839
• Publisher: IEEE
• Year: 2010
• Tongue: English
• Weight: 992 KB
• Volume: 23
• Category: Article
• ISSN: 0894-6507
• DOI: 10.1109/tsm.2010.2072450