Evaluation of conductive-to-resistive layers interaction in thick-film resistors
✍ Scribed by K. Mleczko; Z. Zawiślak; A.W. Stadler; A. Kolek; A. Dziedzic; J. Cichosz
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 240 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0026-2714
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## Abstract Resistivity __ρ__ and thermoelectric power __S__ of RuO~2~‐based thick‐film resistors were measured in tempera‐ ture range __T__ = 77–1100 K. Sharp maxima of __ρ__ and __S__ occur at 1000 K. __ρ__ = 7.5 × 10^3^ Ω cm and __S__ = +90 μV/K at the maxima, while __ρ__ = 2.5 × 10^3^ Ω cm and
Parameters for the fracture mechanics of thick film materials are scarce in the literature. One reason is that for many such materials it is very difficult to produce a bulk specimen as required for most standard tests. This paper describes an alternative method for measuring the fracture resistance