𝔖 Bobbio Scriptorium
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Evaluation of a vertical x-ray stepper

✍ Scribed by M. Fukuda; M. Suzuki; S. Ishihara


Book ID
103598310
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
427 KB
Volume
13
Category
Article
ISSN
0167-9317

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The alignment accuracy of the X-ray stepper SS-1 for synchrotron radiation (SR) lithography was evaluated. The mark state changes whenever the process layer is deposited. The alignment mark can be classified into four types based on the mark composition of all the process layers in LSI manufacturing