Multilayered silicon-germanium (SiGe) films consisting of alternating sublayers with different mechanical properties have been epitaxially deposited by an ultra-high vacuum chemical vapor deposition (UHV/ CVD) system. We report engineering of the mechanical properties of SiGe multilayer films by a c
โฆ LIBER โฆ
Evaluating nanotribological behavior of annealing Si0.8Ge0.2/Si films
โ Scribed by Ming-Jhang Wu; Hua-Chiang Wen; Shyh-Chi Wu; Ping-Feng Yang; Yi-Shao Lai; Wen-Kuang Hsu; Wen-Fa Wu; Chang-Pin Chou
- Book ID
- 113800523
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 992 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0026-2714
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