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EUV emission from solids illuminated with a laser-plasma EUV source

✍ Scribed by A. Bartnik; H. Fiedorowicz; R. Jarocki; J. Kostecki; R. Rakowski; M. Szczurek

Book ID
106029113
Publisher
Springer
Year
2008
Tongue
English
Weight
290 KB
Volume
93
Category
Article
ISSN
0721-7269

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We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range