## Abstract A new method of generation of __N__‐acyl‐__N__‐alkyl nitroxide radicals by photolysis of __N__‐nitrosoamides is described. ESR parameters are reported for 17 radicals of the general formula RCON(R′)O^.^; the high resolution obtained allows conformational analysis which shows a preferr
ESR studies of nitroxide radicals formed in the low temperature photolysis of N-nitrosamines
✍ Scribed by Avinash Joshi; George C. Yang
- Publisher
- John Wiley and Sons
- Year
- 1981
- Tongue
- English
- Weight
- 410 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0749-1581
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✦ Synopsis
Abstract
Various N‐nitrosamines were photolyzed in toluene solution in the temperature range −100°C to −30°C to yield dialkyl nitroxides. The nitrosamines studied were N‐nitrosodimethylamine, N‐nitrosodiethylamine, N‐nitrosodipropylamine, N‐nitrosodibutylamine and N‐nitrosodicyclohexylamine. Subsequent nitroxide side products were also detected by ESR, and a mechanism for their formation is proposed. Temperature dependent hyperfine couplings of the methylene protons were observed for a few radicals of the type R~1~CH~2~NO^˙^R~2~.
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