Erratum to: “Ion-beam-induced epitaxial crystallisation of metastable Si1−x−yGexCy layers fabricated by Ge and C ion implantation” [Nucl. Instr. and Meth. B 106 (1995) 289]

✍ Scribed by Naoto Kobayashi; Masataka Hasegawa; Nobuyuki Hayashi; Hisao Tanoue; Hajime Shibata; Yunosuke Makita

• Book ID: 113288075
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 512 KB
• Volume: 114
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(96)80073-5