Erratum to: “Damage profiles in as-implanted 〈100〉 Si crystals: strain by X-ray diffractometry versus interstitials by RBS-channeling” [Nucl. Instr. and Meth. B 120 (1996) 64–67]

✍ Scribed by R. Nipoti; M. Servidori; M. Bianconi; S. Milita

• Book ID: 114169964
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 40 KB
• Volume: 122
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(97)80020-1