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Erratum to: “Damage profiles in as-implanted 〈100〉 Si crystals: strain by X-ray diffractometry versus interstitials by RBS-channeling” [Nucl. Instr. and Meth. B 120 (1996) 64–67]

✍ Scribed by R. Nipoti; M. Servidori; M. Bianconi; S. Milita


Book ID
114169964
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
40 KB
Volume
122
Category
Article
ISSN
0168-583X

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