Erratum: Structure and electrical conductivity of polycrystalline silicon films grown by molecular-beam deposition accompanied by low-energy ion bombardment of the growth surface [Semiconductors 31, 237–240 (March 1997)]

✍ Scribed by D. A. Pavlov; A. F. Khokhlov; D. V. Shungurov; V. G. Shengurov

• Book ID: 110119685
• Publisher: Springer
• Year: 1997
• Tongue: English
• Weight: 19 KB
• Volume: 31
• Category: Article
• ISSN: 1063-7826
• DOI: 10.1134/1.1187276