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Er3+-doped silica–hafnia films for optical waveguides and spherical resonators

✍ Scribed by G.C. Righini; S. Berneschi; G. Nunzi Conti; S. Pelli; E. Moser; R. Retoux; P. Féron; R.R. Gonçalves; G. Speranza; Y. Jestin; M. Ferrari; A. Chiasera; A. Chiappini; C. Armellini


Book ID
116671617
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
577 KB
Volume
355
Category
Article
ISSN
0022-3093

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UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen