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Bede X-ray Metrology is collaborating with IMEC to investigate the use of X-ray metrology in the process control of new semiconductor materials used at the 45 nm technology node and below.
The BedeMetrix-L with Microsource and ScribeView optics X-ray metrology system for new semiconductor materials characterization will be installed at IMEC's 300mm research facility.The BedeMetrix-L uses a combination of High Resolution X-ray Diffraction (HRXRD), X-ray Diffraction (XRD) and X-ray Reflectivity (XRR) techniques on a single platform for a wide range of front and back end process control applications including strained silicon, highk gate dielectrics, metal gates, barrier metals, interconnects and porous low-k ILD.The Microsourceยฎ with ScribeView optics enables measurements of strain silicon parameters in scribe lines and metrology pads used in the latest state of the art 45nm process.
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For x-ray metrology tool 3upplier Bede plc (Durham, UK) first-half 2001 sales were ยฃ3.1m (up 118% on first-half 2000) from shipments