✦ LIBER ✦

Equipment & Materials Processing

Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 550 KB
Volume: 14
Category: Article
ISSN: 0961-1290
DOI: 10.1016/s0961-1290(01)80158-7

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Bede X-ray Metrology is collaborating with IMEC to investigate the use of X-ray metrology in the process control of new semiconductor materials used at the 45 nm technology node and below. The BedeMetrix-L with Microsource and ScribeView optics X-ray metrology system for new semiconductor materials