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Equilibrium dopant incorporation in CVD silicon epitaxy

✍ Scribed by Dr. H. Kühne; Th. Morgenstern

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Incorporation of dopants into epitaxial

✍ H. Kühne 📂 Article 📅 1982 🏛 John Wiley and Sons 🌐 English ⚖ 390 KB

Kinetics of the Incorporation of Dopants

✍ Dipl.-Chem. H. Kühne 📂 Article 📅 1982 🏛 John Wiley and Sons 🌐 English ⚖ 413 KB

Dopant incorporation kinetics and abrupt

✍ J.-E. Sundgren; J. Knall; W.-X. Ni; M.-A. Hasan; L.C. Markert; J.E. Greene 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 808 KB

Activity coefficient and incorporation o

✍ Dr. H. Kühne 📂 Article 📅 1984 🏛 John Wiley and Sons 🌐 English ⚖ 499 KB

Growth-rate-independent dopant transport

✍ Ján Halaj 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 340 KB

Decomposition equilibrium of arsine and

✍ G. A. Kokovin†; N. A. Testova; A. A. Titov; Th. Morgenstern; Dr. H. Kühne 📂 Article 📅 1985 🏛 John Wiley and Sons 🌐 English ⚖ 465 KB