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Epitaxial growth of oxides on metals using pulsed laser deposition with a pulsed oxygen source

โœ Scribed by C.H. Wang; T.J. Jackson; R.E. Somekh; J.A. Leake; J.E. Evetts

Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
375 KB
Volume
48
Category
Article
ISSN
0042-207X

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Zinc oxide (ZnO) thin films have been prepared by pulsed laser deposition (PLD) technique at room temperature on quartz and single crystal silicon (1 0 0) substrates. The oxygen ambient gas pressure was attained at 6 Torr during the deposition. The deposited films were post-growth annealed in air at