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Epitaxial growth of gallium nitride by ion-beam-assisted evaporation

✍ Scribed by Chan-Wook Jeon; Seon-Hyo Kim; Ig-Hyeon Kim


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
607 KB
Volume
270
Category
Article
ISSN
0040-6090

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Raman spectroscopy was applied to monitor the growth of GaN at temperatures around 600 Γ„C without interrupting the growth process. GaN was deposited on GaAs(100) and Si(111) substrates by molecular beam epitaxy using elemental Ga and atomic nitrogen provided by an r.f. plasma source. Sufficient sign