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Enhancement of electron mobility by preventing pit formation at the In0.52Al0.48As/In0.8Ga0.2As heterointerface using an inserted In0.53Ga0.47As layer

✍ Scribed by Tatsuo Nakayama; Hironobu Miyamoto; Emi Oishi; Norihiko Samoto


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
666 KB
Volume
150
Category
Article
ISSN
0022-0248

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