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Enhanced resputtering and asymmetric interface mixing in W/Si multilayers

✍ Scribed by Christian Eberl, Tobias Liese, Felix Schlenkrich, Florian Döring…


Book ID
120782706
Publisher
Springer
Year
2013
Tongue
English
Weight
815 KB
Volume
111
Category
Article
ISSN
1432-0630

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Determination of the atomic mixing layer
✍ S. Hofmann; W. Mader 📂 Article 📅 1990 🏛 John Wiley and Sons 🌐 English ⚖ 382 KB

## Abstract Sputter‐deposited multilayers of Si and Ta with a nominal period length of a double layer (Ta + Si) of 20 nm were studied with AES depth profiling and with transmission electron microscopy (TEM). The asymmetric shape of the measured Si layer profiles was fitted to model calculations bas