Emerging Technologies for Food Processing presents a comprehensive review of innovations in food processing, stresses topics vital to the food industry today, and pinpoints the trends in future research and development. This volume contains 27 chapters and is divided into six parts covering topics s
Emerging Technologies for In Situ Processing
โ Scribed by H. Ahmed (auth.), Daniel J. Ehrlich, Van Tran Nguyen (eds.)
- Publisher
- Springer Netherlands
- Year
- 1988
- Tongue
- English
- Leaves
- 285
- Series
- NATO ASI Series 139
- Edition
- 1
- Category
- Library
No coin nor oath required. For personal study only.
โฆ Table of Contents
Front Matter....Pages i-x
In-Situ Processing Combining MBE, Lithography and Ion Implantation....Pages 1-11
Motivations and Early Demonstrations for In-Situ Processings for III โ V Semiconductor Devices....Pages 13-21
Laser Etching and Microelectronic Applications....Pages 23-31
Laser-Induced Chemical Processing of Materials....Pages 33-43
High Technology Manufacturing: Critical Issues for the Future....Pages 45-54
Ultra High Vacuum Processing: MBE....Pages 55-60
Epitaxial Growth of III-V Materials on Implanted III-V Substrates....Pages 61-70
Mechanisms of Laser-Induced Deposition from the Gas Phase....Pages 71-81
Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition Of Platinum....Pages 83-91
Excimer Laser Projection Patterning....Pages 93-104
Excimer Laser Patterning And Etching Of Metals....Pages 105-112
Ion Projection Lithography....Pages 113-120
UV Light-Assisted Deposition of Al on Si from TMA....Pages 121-129
E-Beam Induced Decomposition of Inorganic Solids....Pages 131-136
Electronic Connection Through Silicon Wafers....Pages 137-143
The Development and use of Novel Precursors for Photolytic Deposition of Dielectric Films....Pages 145-152
Focused Ion Beam Induced Deposition....Pages 153-161
Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks....Pages 163-169
Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation....Pages 171-178
Focused Ion Beam Technology and Applications....Pages 179-199
Laser Direct Writing for Device Applications....Pages 201-211
Laser-Induced Photoetching of Semiconductors with Chlorine....Pages 213-220
Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication....Pages 221-232
Synthesis and Characterization of Laser Driven Powders....Pages 233-240
Physical Properties of Laser Written Chromium Oxide Thin Films....Pages 241-247
Uv Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime....Pages 249-256
Laser Assisted Plasma Etching Of Silicon Dioxide....Pages 257-264
Nd: YAG Laser Processing for Circuit Modification and Direct Writing of Silicon Conductors....Pages 265-271
Study of Excimer Laser Enhanced Etching of Copper and Silicon with (Sub) Monolayer Coverages of Chlorine....Pages 273-278
Surface Chemical Probes and their Application to the Study of in Situ Semiconductor Processing....Pages 279-288
Back Matter....Pages 289-290
โฆ Subjects
Characterization and Evaluation of Materials;Electrical Engineering
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