Ellipsometric measurements on tantalum and tantalum oxide films and variation of the optical constants with structure
β Scribed by Rosa M. Aguado Bombin; W.E.J. Neal
- Publisher
- Elsevier Science
- Year
- 1977
- Tongue
- English
- Weight
- 293 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0040-6090
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## Abstract Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10^β4^ mbar. The films were annealed in air for an hour in the
It has been shown previously that the kinetics of anodic film growth on Ta, Nb and Zr often depend strongly on the nature of the electrolyte. This work is an attempt to resolve this anomaly and the inconsistencies in the reported structures of the oxide layers. Electron diffraction showed the anodic