✦ LIBER ✦

Electrostatic chuck for EUV masks

✍ Scribed by Gerhard Kalkowski; Stefan Risse; Sandra Müller; Gerd Harnisch

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Flatness characterization of EUV mask ch

✍ Gerhard Kalkowski; Stefan Risse; Sandra Müller 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 784 KB

Electrostatic chucks for lithography app

✍ G. Kalkowski; S. Risse; G. Harnisch; V. Guyenot 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 249 KB

Dry etch processes for the fabrication o

✍ F. Letzkus; J. Butschke; M. Irmscher; F.M. Kamm; C. Koepernik; J. Mathuni; J. Ra 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 383 KB

System for illumination of an EUV-nanoli

✍ S. Yu. Zuev; A. E. Pestov; V. N. Polkovnikov; N. N. Salashchenko; A. S. Skryl’; 📂 Article 📅 2011 🏛 Pleiades Publishing 🌐 English ⚖ 446 KB

Fundamental study of an electrostatic ch

✍ Asano, K.; Hatakeyama, F.; Yatsuzuka, K. 📂 Article 📅 2002 🏛 IEEE 🌐 English ⚖ 246 KB

Attenuated phase-shift mask for line pat

✍ Minoru Sugawara; Akira Chiba; Hiromasa Yamanashi; Hiroaki Oizumi; Iwao Nishiyama 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 277 KB