Electronographic investigation of the degree of preferred orientation of nickel electrodeposits

✍ Scribed by N.A. Pangarov; S.D. Vitkova; I. Uzunova

• Publisher: Elsevier Science
• Year: 1966
• Tongue: English
• Weight: 361 KB
• Volume: 11
• Category: Article
• ISSN: 0013-4686
• DOI: 10.1016/0013-4686(66)80087-7

✦ Synopsis

The influence of a polished platinum substrate. upon the degree of orientation of [IlO& oriented nickel electrodeposits has been investigated electrono P aphically, in relation to layer thickness and current density. It has been shown that the influence o the substrate is restricted to only very thin layers of electrodeposited nickel. This influence d ecreases with the increase of current density, or with the decrease of sire of the nickel crystallites.

The obtained experimental data are in good agreement with the two-dimensional theory of preferred orientation, when the epitaxial influence of the polycrystalline substrate is taken into consideration.

R&mm&Recherche tlectronographique de l'influence d'un substrat de Pt poli sur le degr& d'orientation d'tlectro-depots de Ni [llO], en relation avec l'6paisseur et la densite de courant. 11 est montr6 que l'intluence du substrat se restreint seulement it des couches t&s minces de Ni electrodepos6; elle decroit quand s'accroissent la densit de courant ou la taille des cristallites de Ni.

Les resultats experimentaux obtenus s'accordent bien avec la th6orie bidimensionnelle dune orientation privilegi&e, quand on prend en consideration l'inlluence epitaxique du substrat polycristallitl.