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Electron-projection microfabrication system


Book ID
104263771
Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
293 KB
Volume
26
Category
Article
ISSN
0042-207X

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๐Ÿ“œ SIMILAR VOLUMES


Capability of ion beam projection optics
โœ Y. Madokoro; S. Tomimatsu; Y. Kawanami; K. Umemura ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 442 KB

Applicability of ion beam projection optics for sputtering fabrication is investigated by using third-order aberration theory. Under the Kthler illumination condition that minimizes off-axial aberration, the total beam current of the shaped beam formed in large-reduction-ratio projection column is l