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Electron mobility characteristics of n-channel metal-oxide-semiconductor field-effect transistors fabricated on Ge-rich single- and dual-channel SiGe heterostructures

✍ Scribed by Lee, Minjoo L.


Book ID
120586075
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
354 KB
Volume
95
Category
Article
ISSN
0021-8979

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