The weak dissociative electron attachment to CHsCI below = 1 eV is very strongly dependent on the gas temperature; the rate constant for the process increases by 3 to 4 orders of magnitude when the temperature is increased from 300 to 750 K.
Electron attachment to Cl2
β Scribed by D.L. McCorkle; A.A. Christodoulides; L.G. Christophorou
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 306 KB
- Volume
- 109
- Category
- Article
- ISSN
- 0009-2614
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