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Electromigration in integrated circuit interconnects studied by X-ray microscopy

✍ Scribed by G. Schneider; G. Denbeaux; E. Anderson; W. Bates; F. Salmassi; P. Nachimuthu; A. Pearson; D. Richardson; D. Hambach; N. Hoffmann; W. Hasse; K. Hoffmann

Book ID: 114166326
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 262 KB
Volume: 199
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(02)01565-3

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