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Stress-induced phenomena in nanosized copper interconnect structures studied by x-ray and electron microscopy

✍ Scribed by Zschech, Ehrenfried; Huebner, Rene; Chumakov, Dmytro; Aubel, Oliver; Friedrich, Daniel; Guttmann, Peter; Heim, Stefan; Schneider, Gerd

Book ID: 115543770
Publisher: American Institute of Physics
Year: 2009
Tongue: English
Weight: 678 KB
Volume: 106
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.3254166

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