Electromagnetic and thermal evaluation of an applicator specialized to permit high-resolution non-perturbing optical evaluation of cells being irradiated in the W-band

✍ Scribed by William F. Pickard; Eduardo G. Moros; Gal Shafirstein

• Publisher: John Wiley and Sons
• Year: 2009
• Tongue: English
• Weight: 802 KB
• Volume: 31
• Category: Article
• ISSN: 0197-8462
• DOI: 10.1002/bem.20539

✦ Synopsis

Abstract

To permit epi‐illuminated, high‐resolution optical microscopy of cells in monolayer culture during unperturbed W‐band (75–110 GHz) irradiation, a new class of applicator has been developed based upon WR10 rectangular waveguide components: the cells are normally plated onto the underside of a coverslip which is then placed against the under side of a waveguide flange and receives a roughly circular exposure pattern, with the ±1 dB central spot roughly 1 mm in diameter. Constructed and tested with 94 GHz millimeter waves, water‐immersion optics, and free‐convection cooling, the applicator works robustly and permits SARs at the cell layer as high as 4500 W/kg before the steady‐state temperature rise at the cell layer exceeds 0.5 K. Bioelectromagnetics 31:140–149, 2010. © 2009 Wiley‐Liss, Inc.