Electromagnetic and thermal characterization of an UHF-applicator for concurrent irradiation and high resolution non-perturbing optical microscopy of cells

✍ Scribed by William F. Pickard; Eduardo G. Moros; Bibianna A. Cha; Petr Novak

• Publisher: John Wiley and Sons
• Year: 2006
• Tongue: English
• Weight: 499 KB
• Volume: 27
• Category: Article
• ISSN: 0197-8462
• DOI: 10.1002/bem.20250

✦ Synopsis

Abstract

To permit trans‐illuminated, high‐resolution optical microscopy during unperturbed ultrahigh frequency (UHF) irradiation, a novel new class of applicator has been designed based upon a shielded‐pair transmission line. As constructed and tested with water‐immersion optics and air cooling, the applicator works most robustly over 700–1100 MHz and permits SARs at the cell layer as high as 50 W/kg before the steady state temperature rise at the cell‐layer exceeds 0.5 K. Bioelectromagnetics 27:593–601, 2006. © 2006 Wiley‐Liss, Inc.