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Electroless deposition of semiconductor films

✍ Scribed by N.C. Sharma; R.C. Kainthla; D.K. Pandya; K.L. Chopra


Book ID
107862654
Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
259 KB
Volume
60
Category
Article
ISSN
0040-6090

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Thin films of cobalt that contain small amounts of tungsten [Co(W)] were deposited by the electroless process. Those films do not contain either phosphorus or boron which are included in most electroless cobalt films processes. The deposition bath for Co(W) thin films include Co ions, tungstate ions

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## Abstract For Abstract see ChemInform Abstract in Full Text.