Electroless deposition of Co(W) thin fil
β
Y Sverdlov; Y Shacham-Diamand
π
Article
π
2003
π
Elsevier Science
π
English
β 574 KB
Thin films of cobalt that contain small amounts of tungsten [Co(W)] were deposited by the electroless process. Those films do not contain either phosphorus or boron which are included in most electroless cobalt films processes. The deposition bath for Co(W) thin films include Co ions, tungstate ions