Electrode kinetics of Bi in the presence of hydroquinone

✍ Scribed by B Lovreček; I Mekjavić

• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 634 KB
• Volume: 17
• Category: Article
• ISSN: 0013-4686
• DOI: 10.1016/0013-4686(72)90025-4

✦ Synopsis

The kinetics of the cathodic and anodic process on the stationary drop of Bi amalgam in the Bi*+ ion solution in 2 M HClO, has been investigated galvanostatically with and without hydroquinone. The processes of deposition and dissolution of bismuth take place in the investigated potential range from -O&l-O*59 V(nhe). By the analysis of kinetic parameters it is established that mechanisms of the process for given potential ranges were the same both for the systems with hydroquinone and for the pure solution. The TJlog i curves for systems with hydroquinone are shifted towards lower apparent cds, this being attributed to the adsorption of hydroquinone on the electrode surface. The degree of the electrode coverage was determined from the shift of these curves. At lower hydroquinone concentrations the coverage data satisfy the Langmuir isotherm, whereas at higher concentrations the repulsive forces among the adsorbed molecules come in to play. This range of higher concentrations is not adequately represented by the Frumkin isotherm. R&urn&-L'Ctude cin&ique des proc&ssus cathodique et anodique a 8tt conduite sur une goutte sta-I)+ tionaire de l'amalgame Bi dans la solution del'ion Bi dans 2 M HClO, avec et sans la presence d'hydroquinone, par la mhthode galvanostatique. Dans la region examind, du potentiel entre -0.44 et 0,59 V (6hn) ont lieu les proc&sus de la d& position et de la dissolution du bismuth. A la suite d'une analyse des param&res cinttiques on a dtabli que les m6canismes du procbsus des rkgions d&fines du potentiel Ctaient les &rnes pour les systbmes avec hydroquinone comme pour la solution pure. hS COUrbeS &log i SOId