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Electrochromic phenomena in transition metal oxide thin films prepared by thermal evaporation

✍ Scribed by S. Papaefthimiou; G. Leftheriotis; P. Yianoulis


Book ID
105550532
Publisher
Springer-Verlag
Year
1998
Tongue
English
Weight
662 KB
Volume
4
Category
Article
ISSN
0947-7047

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Electron beam evaporation was employed to deposit hafnium on silicon (100) substrate, followed by a rapid thermal oxidation process to fabricate hafnium dioxide thin film. Hafnium was transformed to hafnium oxide above a oxidizing temperature of 500 8C. An interfacial layer of hafnium silicate was o