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Electrochemical properties of vanadium oxide coatings grown by APCVD on glass substrates

✍ Scribed by Louloudakis, D.; Vernardou, D.; Spanakis, E.; Katsarakis, N.; Koudoumas, E.

Book ID
122061157
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
489 KB
Volume
230
Category
Article
ISSN
0257-8972

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Tin oxide thin films were grown by atmospheric pressure chemical vapor deposition (APCVD) on glass substrates at temperatures of 400, 500 and 600 1C with various deposition times from 15 to 60 min with 15 min time intervals. A homemade horizontal reactor was used for deposition from SnCl 2 ΓΎ 2H 2 O