## Abstract Optical microscopy (OM), scanning electron microscopy (SEM) and analytical transmission electron microscopy (AEM) were used to characterise anocid films on aluminium. Of special interest in our investigations was to study the dependence of the microstructure of the films on the current
Electrochemical kinetic study on the growth of porous anodic oxide films on aluminium
β Scribed by G. Patermarakis; K. Moussoutzanis
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 1004 KB
- Volume
- 40
- Category
- Article
- ISSN
- 0013-4686
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β¦ Synopsis
Aluminium specimens
were anodized galvanostatically in a thermostated and vigorously stirred bath of H,SO, 15% w/v at different bath temperatures and current densities and for long anodization times, suflicient to produce the maximum or near maximum limiting film thickness, and the anodic potential was followed. Results confirmed that the rate controlling step of the steady-state growth of the barrier layer is the charge transport across this layer, which is near solely due to the migration of anions; oxide is produced only in a region adjacent to the AI-AI,O, interface. Taking into consideration the structural features of the barrier layer oxide and by assuming a uniform oxide nature and one kind of migrating anions or cations, it has become possible to formulate simplified high field ion migration electrochemical kinetic equations.
They were found to be non-satisfactory when applied at low anodization temperatures, but become applicable at high temperatures or low barrier layer thicknesses. Their application postulated that the charge transfer at the AI-Al,O, interface, Al-3e --t AIS+, takes place rather through successive "one electron" transfer elementary steps. Also, the charge transport across the barrier layer oxide bulk takes place through a concomitant migration of the ions O"-, OH-and SO:-.
A model for the ions transport was suggested which gives a physical meaning to the field assisted oxide dissolution at pore bases, explains the incorporation of SO:-, SO,, OH-and H,O and predicts the change of their concentration, of the oxide nature and of the values of kinetic parameters across the barrier layer; it also predicts that an H+ migration may take place during oxide growth.
π SIMILAR VOLUMES
The temperature distribution alongthe vertical pores of the anodicoxide films onalumhrium was calculated for usual conditions of anodizing in 10% sulphuric acid solution by taking into account the accumulation of both Joule heat and the heat of formation of oxide at the pore-base and the outward con
A strict kinetic model, governing the growth of porous anodic 01 2 0 3 films, was developed in a form easily and directly applicable to a galvanostatic anodization in a stirred bath at constant temperature . It was applied to the experimental results obtained from film growth at 25 Β°C, 1SmAcm -2 and
A kinetic study on the growth of porous anodic Al,O, films on Al metal, anodized galvanostatically at current densities 5-75mAcm-' in a stirred 15% w/v H,SO, bath solution at bath temperatures 204OYZ, was performed. A strict kinetic model was formulated which was, nevertheless, rather complex. There
The mechanism of growth of porous anodic AI,O, films at various bath temperatures, current densities and H,SO, concentrations was studled for tiims produced in a vigorously stirred bath at anodization times higher than those at which the maximum pore diameter behind or at film surface approaches fir