Electrochemical evaluation of thin films and coatings deposited with ion beam assisted deposition (IBAD) using scanning electrochemical microelectrode

✍ Scribed by E. Vera; F. Stippich; K. Meinert; Prof. Dr. G. K. Wolf

• Book ID: 102945141
• Publisher: John Wiley and Sons
• Year: 1998
• Tongue: English
• Weight: 607 KB
• Volume: 29
• Category: Article
• ISSN: 0933-5137
• DOI: 10.1002/mawe.19980290209

✦ Synopsis

Abstract

In this contribution the application of a modern technique‐scanning electrochemical microelectrode – for the evaluation of thin films which were deposited (IBAD) is illustrated. New tendencies in the development of thin films with anticorrosive purpose lead to the development of multi‐layer systems acting similar to those commonly, applied in the industry, however, being much thinner. Imperfections and defects are commonly introduced in the coating during the deposition process, and these affect the anticorrosive properties of the film. In order to make a local electrochemical study of these multi‐layer systems we have developed equipment in order to perform electrochemical surface‐scans (potential and current density) on the basis of a microelectrode with a good lateral resolution (approximately 20 μm). Al‐Al~2~O~3~ multilayers on steel substrates with differently designed interfaces were investigated to show the variation of uniform and local electrochemical information obtained in dependence on the coating deposition parameters.