The purpose of this work was to study surface diffusion of atoms in Au-Ag films deposited on SiO 2 substrate under the action of a d.c. field, focusing on the effect of chemical reaction at the Au-Ag/SiO 2 interface on the electromigration behaviour. Atomic force microscopy measurement depicted the
Electrochemical characterization of the electrical deposition of Co and properties of deposited films using amorphous ribbons as substrate
β Scribed by Koh-ichi Maruyama; Hiroo Numata; Takashi Sato; Osamu Nittono
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 217 KB
- Volume
- 130
- Category
- Article
- ISSN
- 0424-7760
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β¦ Synopsis
Both nonelectrically deposited Co-P and Co-Fe-B and electrically deposited Co films were prepared on rapidquenched amorphous alloy ribbons. These Co-based alloy deposits exhibited characteristic polycrystalline structures, surface morphology, and magnetic properties, which were dependent on the species of the amorphous substrates. The electrochemical polarization measurements of substrate electrodes revealed that the electrocatalysis of substrates (e.g., for the anodic oxidation of reducing agent) thoroughly interpreted the deposition potential and the rate of nonelectrical deposition, and the overpotential of electrical deposition were dependent on alloy element of substrate. These electrochemical parameters influence the initial step of deposition, and hence determine the structural and magnetic properties of the deposits obtained. Furthermore, a basic study of the electrical deposition processes on an amorphous ribbon substrate has been carried out in connection with the structural and magnetic properties of the deposits.
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