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Electrical resistivity of Ti–Ni binary and Ti–Ni–X (X = Fe, Cu) ternary shape memory alloys

✍ Scribed by S.K. Wu; H.C. Lin; T.Y. Lin

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
166 KB
Volume
438-440
Category
Article
ISSN
0921-5093

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Electrical resistance (R) and deformation (ε) are studied in Ti-45 at.%Ni-5 at.%Cu alloy, electrically driven through the transformation range under different constant stress levels in the range 10-500 MPa. Specimens with increasing preliminary cold-work levels (13, 19, 28 and 45%) were selected, in