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Microstructure and shape memory behavior of annealed Ti–36.8 at.% Ni–11.6 at.% Cu thin film

✍ Scribed by A. Ishida; M. Sato; K. Ogawa

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 518 KB
Volume: 481-482
Category: Article
ISSN: 0921-5093
DOI: 10.1016/j.msea.2006.12.212

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