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Electrical resistance of copper phthalocyanine thin films as influenced by substrates, electrodes and physical features of the films

✍ Scribed by A. de Haan; A. Decroly

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
979 KB
Volume
30
Category
Article
ISSN
0925-4005

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✦ Synopsis

The influence of several features upon the electrical resistance of gas-sensitive copper phthalocyanine (CuPc) thin films has been investigated. The main factors studied concern the substrate nature (AI203 or Si/SiO2), electrode layout, film thickness and deposition rate. Subsequent annealing round 200 Β°C may induce more or less deep structural changes subject to the type of substrate. Molecular deterioration may also occur by way of electrochemical processes under some conditions. The effect of humidity on the electrical resistance also appears to be substrate dependent.

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Thin films of phthalocyaninatomanganese ( PcMn ) in the thickness range of 100 nm have been prepared by vapour deposition on quartz glass substrates. The films were characterized in situ during film growth and following film deposition by measurements of the electrical conductivity under DC applied