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Electrical characterization of deep levels existing in fully implanted and rapid thermal annealed p+n InP junctions

✍ Scribed by L. Quintanilla; S. Duen~as; E. Casta´n; R. Pinacho; R. Pela´ez; J. Barbolla


Book ID
110269997
Publisher
Springer US
Year
1999
Tongue
English
Weight
185 KB
Volume
10
Category
Article
ISSN
0957-4522

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