𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Electrical Characteristics of ${\rm Al}_{2}{\rm O}_{3}/{\rm InSb}$ MOSCAPs and the Effect of Postdeposition Annealing Temperatures

✍ Scribed by Trinh, Hai Dang; Lin, Yueh Chin; Chang, Edward Yi; Lee, Ching-Ting; Wang, Shin-Yuan; Nguyen, Hong Quan; Chiu, Yu Sheng; Luc, Quang Ho; Chang, Hui-Chen; Lin, Chun-Hsiung; Jang, Simon; Diaz, Carlos H.


Book ID
125469341
Publisher
IEEE
Year
2013
Tongue
English
Weight
809 KB
Volume
60
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Effects of oxygen content and postdeposi
✍ Tung-Ming Pan; Chun-Chin Huang πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 571 KB

In this paper, we describe the physical properties and electrical characteristics of thin Sm 2 O 3 dielectric films deposited on Si (100) by means of rf reactive sputtering. The structural and morphological features of these films were studied, as a function of the growth conditions (three various a