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Electrical and optical properties of carbon implanted In2O3 thin film

✍ Scribed by K. Hanamoto; M. Sasaki; T. Yoneda; K. Miyatani; H. Miki; C. Kaito; Y. Nakayama


Book ID
114172213
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
402 KB
Volume
168
Category
Article
ISSN
0168-583X

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## Abstract Glancing‐angle deposition (GLAD) was used in this work to grow transparent oxide Cu~2~O thin films by annealing in air at 185 °C of copper films deposited firstly by this method onto glass substrates. The annealing temperature of 185 °C corresponds to the optimal temperature that corres