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Electrical and optical properties of boron and nitrogen implanted In2O3 thin films

✍ Scribed by K Hanamoto; M Sasaki; K Miyatani; C Kaito; H Miki; Y Nakayama

Book ID
114164285
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
147 KB
Volume
173
Category
Article
ISSN
0168-583X

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## Abstract Glancing‐angle deposition (GLAD) was used in this work to grow transparent oxide Cu~2~O thin films by annealing in air at 185 °C of copper films deposited firstly by this method onto glass substrates. The annealing temperature of 185 °C corresponds to the optimal temperature that corres