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Electric field intensity variation in the vicinity of a perfectly conducting conical probe: Application to near-field microscopy

✍ Scribed by H. Cory; A. C. Boccara; J. C. Rivoal; A. Lahrech

Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
142 KB
Volume
18
Category
Article
ISSN
0895-2477

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✦ Synopsis

A ¨ibrating metallic conical probe has been used in near-field microscopic measurements to obtain optical resolutions much smaller than the wa¨elength. Numerical simulations of these complex problems ha¨e drawn most of the attention in the past. We propose here an analytical expression for the electric field intensity in the near region of a probe situated abo¨e the surface of a semi-infinite dielectric medium. It is gi¨en as a function of the obser¨ation point location, with the cone aperture, the dielectric medium permitti¨ity, and the characteristics of the incident plane wa¨e as parameters.

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