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Efficient and robust algorithms for Monte Carlo and e-beam lithography simulation

✍ Scribed by V.V. Ivin; M.V. Silakov; N.V. Vorotnikova; D.J. Resnick; K.N. Nordquist; L. Siragusa

Book ID
114155323
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
155 KB
Volume
57-58
Category
Article
ISSN
0167-9317

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The electron backscattering coefficients of thin tri-level-process layer systems in the energy range from 2.5 to 40.0 keV have been calculated by Monte Carlo simulations. The results show a significant variation of the backscattering with the primary electron energy and the atomic number of the mate