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Effects of thickness and rf plasma oxidizing on structural and optical properties of SiOxNy thin films

✍ Scribed by S.H. Mohamed; M. Raaif

Book ID: 108278678
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 927 KB
Volume: 205
Category: Article
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2010.07.019

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