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Effects of substrate temperature on the structure and properties of reactive pulsed laser deposited CNx films

โœ Scribed by C.W. Ong; X.-A. Zhao; Y.C. Tsang; C.L. Choy; P.W. Chan

Book ID
107864897
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
370 KB
Volume
280
Category
Article
ISSN
0040-6090

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In this study, SrAl 2 O 4 :Eu 2 + ,Dy 3 + thin film phosphors were deposited on Si (1 0 0) substrates using the pulsed laser deposition (PLD) technique. The films were deposited at different substrate temperatures in the range of 40-700 1C. The structure, morphology and topography of the films were