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Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD

✍ Scribed by Joon Sung Lee; Han Wook Song; Won Jong Lee; Byoung Gon Yu; Kwangsoo No

Book ID
108388903
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
618 KB
Volume
287
Category
Article
ISSN
0040-6090

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## Abstract Using metal–organic (MO)CVD, lanthanum trifluoride (LaF~3~) and oxyfluoride (LaOF) films are deposited on Si(100), glass, and quartz from a La(hfa)~3~diglyme single‐source precursor. The films are characterized using X‐ray diffraction (XRD), scanning electron microscopy (SEM), and atomi