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Effects of postdeposition annealing on the metal–insulator transition of VO 2− x thin films prepared by RF magnetron sputtering

✍ Scribed by Liu, Shiu-Jen; Su, Yu-Tai; Hsieh, Juang-Hsin

Book ID: 127128998
Publisher: Institute of Pure and Applied Physics
Year: 2014
Tongue: English
Weight: 654 KB
Volume: 53
Category: Article
ISSN: 0021-4922
DOI: 10.7567/jjap.53.033201

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