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Effects of plasmas on porous low dielectric constant CVD SiOCH films

โœ Scribed by E. Vinogradova; E. Osei-Yiadom; C.E. Smith; D.W. Mueller; R.F. Reidy


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
650 KB
Volume
86
Category
Article
ISSN
0167-9317

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๐Ÿ“œ SIMILAR VOLUMES


Effect of plasma treatments on interface
โœ Hung-Chun Tsai; Yee-Shyi Chang; Shou-Yi Chang ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 781 KB

The effect of different plasma treatments on the interfacial bonding configurations and adhesion strengths between porous SiOCH ultra-low-dielectric-constant film and SiCN etch stop layer have been investigated in this study. From X-ray photoelectron spectroscopic analyses, interlayer regions of abo